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Boron Activation and Diffusion in Silicon for Varying Initial-Process Conditions during Flash-Assist Rapid Thermal Annealing

Permanent Link: http://ufdc.ufl.edu/UFE0013884/00001

Material Information

Title: Boron Activation and Diffusion in Silicon for Varying Initial-Process Conditions during Flash-Assist Rapid Thermal Annealing
Physical Description: Mixed Material
Copyright Date: 2008

Record Information

Source Institution: University of Florida
Holding Location: University of Florida
Rights Management: All rights reserved by the source institution and holding location.
System ID: UFE0013884:00001

Permanent Link: http://ufdc.ufl.edu/UFE0013884/00001

Material Information

Title: Boron Activation and Diffusion in Silicon for Varying Initial-Process Conditions during Flash-Assist Rapid Thermal Annealing
Physical Description: Mixed Material
Copyright Date: 2008

Record Information

Source Institution: University of Florida
Holding Location: University of Florida
Rights Management: All rights reserved by the source institution and holding location.
System ID: UFE0013884:00001